The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2020

Filed:

Aug. 06, 2018
Applicant:

Concept Laser Gmbh, Lichtenfels, DE;

Inventors:

Florian Bechmann, Lichtenfels, DE;

Tobias Bokkes, Untersiemau, DE;

Philipp Schumann, Itzgrund-Schottenstein, DE;

Alexandra Popp, Bad Staffelstein, DE;

Marie-Christin Ebert, Coburg, DE;

Assignee:

Concept Laser GmbH, Lichtenfels, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B33Y 50/02 (2015.01); B29C 64/153 (2017.01); B29C 64/165 (2017.01); B33Y 40/00 (2020.01); B22F 3/105 (2006.01); G06F 30/00 (2020.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B22F 3/1055 (2013.01); B29C 64/153 (2017.08); B29C 64/165 (2017.08); B33Y 40/00 (2014.12); B33Y 50/02 (2014.12); G06F 30/00 (2020.01); B22F 2003/1057 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12);
Abstract

Apparatus () for additively manufacturing three-dimensional objects () by successive layerwise selective irradiation and consolidation of layers of a build material () which can be consolidated by means of an energy beam (), the apparatus comprising: a first detection device () adapted to detect at least one first process parameter (P), particularly during operation of the apparatus (), and to generate a first data set (DS) comprising information relating to the detected first process parameter (P); at least one second detection device () adapted to detect at least one second process parameter (P), particularly during operation of the apparatus (), and to generate at least one second data set (DS) comprising information relating to the detected second process parameter (P); a data processing device () adapted to link the first data set (DS) with the at least one second data set (DS).


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