The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
May. 07, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Matthew W. Copel, Yorktown Heights, NY (US);
Takashi Ando, Tuckahoe, NY (US);
Ko-Tao Lee, Yorktown Heights, NY (US);
John Rozen, Hastings on Hudson, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1683 (2013.01); H01L 45/08 (2013.01); H01L 45/1206 (2013.01); H01L 45/1226 (2013.01); H01L 45/1266 (2013.01); H01L 45/14 (2013.01); H01L 45/145 (2013.01); H01L 45/147 (2013.01);
Abstract
A method of forming a resistive processing unit is provided. The method includes forming a spacer on a substrate. The method further includes forming an intercalation layer segment on opposite sides of the spacer, and replacing a portion of each of the intercalation layer segments with an insulating region. The method further includes replacing the spacer with an electrolyte layer.