The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Jul. 27, 2016
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Peter Woytowitz, Los Altos, CA (US);
Vincent Burkhart, Cupertino, CA (US);
Michael Rumer, Santa Clara, CA (US);
Karl Leeser, West Linn, OR (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/505 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68735 (2013.01); C23C 16/458 (2013.01); C23C 16/4581 (2013.01); C23C 16/4583 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32715 (2013.01); H01L 21/6833 (2013.01); H01L 21/6875 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A substrate support for a substrate processing system is provided and includes a body and mesas. The mesas are distributed across and extending from and in a direction away from the body. The mesas are configured to support a substrate. Each of the mesas includes a surface area that contacts and supports the substrate. Areal density of the mesas monotonically increases as a radial distance from a center of the substrate support increases.