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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10832925 B1

PDFFull Text
Date of Patent:
Nov. 10, 2020

Filed:

Aug. 04, 2017

Thermal processing device, substrate processing apparatus, thermal processing method and substrate processing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masahiko Harumoto, Kyoto, JP;

Masaya Asai, Kyoto, JP;

Yuji Tanaka, Kyoto, JP;

Koji Kaneyama, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd., , JP;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Laura Edwards

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); H01L 21/02 (2006.01); B05D 1/00 (2006.01); B05D 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67098 (2013.01); B05D 1/60 (2013.01); B05D 3/007 (2013.01); G03F 7/0002 (2013.01); H01L 21/0273 (2013.01); H01L 21/67103 (2013.01); H01L 21/68742 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/02318 (2013.01);
Abstract

A heating plate is stored in a chamber. With a solvent containing gas present in the chamber, a substrate on which a DSA film is formed is held at a position further upward than the heating plate. Thus, neutralization of an atmosphere is performed at a temperature at which microphase separation does not occur. Thereafter, with the solvent containing gas present in the chamber, the substrate is held on an upper surface of the heating plate. Thus, thermal processing is performed on the DSA film on the substrate.

Find Patent Forward Citations

Harumoto, Masahiko. (2020). Thermal processing device, substrate processing apparatus, thermal processing method and substrate processing method (U.S. Patent No. 10832925). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10832925

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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