The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Jul. 25, 2018
Applicants:
Tescan Brno, S.r.o., Brno, CZ;
Tescan Orsay Holding A.s., Brno, CZ;
Inventors:
Assignees:
Tescan Brno, s.r.o., Brno, CZ;
Tescan.Orsay Holding A.S., Brno, CZ;
Primary Examiner:
Int. Cl.
CPC ...
C23F 4/00 (2006.01); H01L 21/3065 (2006.01); H01J 37/305 (2006.01); H01L 21/263 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); C23F 4/00 (2013.01); H01J 37/3056 (2013.01); H01L 21/2633 (2013.01); H01L 22/12 (2013.01); H01J 2237/3114 (2013.01); H01J 2237/31749 (2013.01);
Abstract
A method of uniformly removing material from a sample surface includes the steps of sputtering by means of scanning the surface with a focused ion beam and a simultaneous observing of the sample during sputtering. Uniform sputtering of different materials is achieved by high-angle sputtering from multiple directions, wherein the directions are rotated relative to each other by a non-zero angle.