The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Aug. 09, 2016
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/09 (2006.01); H01J 37/305 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/09 (2013.01); H01J 37/30 (2013.01); H01J 37/3053 (2013.01); H01J 2237/0262 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/20214 (2013.01);
Abstract
A charged particle beam device that can improve machining position precision in section processing using a shielding plate is provided. The invention is directed to a charged particle beam device including: an ion source (); a sample stand () on which a sample () is mounted; a shielding plate () placed so that a portion of the sample () is exposed when seen from the ion source (); and tilt units () that tilt the sample () and the shielding plate () relative to the irradiation direction of an ion beam () from the ion source () to the sample ().