The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
May. 30, 2019
International Business Machines Corporation, Armonk, NY (US);
Jing Sha, White Plains, NY (US);
Dongbing Shao, Wappingers Falls, NY (US);
Yufei Wu, Poughkeepsie, NY (US);
Zheng Xu, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for predicting local layout effect in a circuit design pattern includes obtaining a plurality of circuit design patterns, generating layout images from the circuit design patterns, extracting feature vectors from the layout images by processing the layout images in a computer vision machine learning algorithm, comparing the feature vector extracted from a selected layout image to clusters of feature vectors extracted from the layout images, wherein the clusters of feature vectors include an in-range cluster and an outlier cluster, and labelling a circuit design pattern corresponding to the selected layout image, for which threshold voltage has not been experimentally measured, as being an in-range circuit design pattern or an outlier circuit design pattern, in response to the selected layout image respectively correlating with the in-range cluster or with the outlier cluster.