The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2020

Filed:

Jul. 31, 2018
Applicants:

Dario Locatelli, Milan, IT;

Silvio Maria Reali, Milan, IT;

Paolo Argenta, Milan, IT;

Inventors:

Dario Locatelli, Milan, IT;

Silvio Maria Reali, Milan, IT;

Paolo Argenta, Milan, IT;

Assignee:

TENOVA S.p.A., Milan, IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 13/00 (2006.01); F27D 3/00 (2006.01); F27D 21/00 (2006.01); F27D 19/00 (2006.01); C21B 13/12 (2006.01); F27B 7/28 (2006.01); F27B 3/28 (2006.01); F27B 3/18 (2006.01); C21C 5/56 (2006.01); C21C 5/52 (2006.01); F27D 3/14 (2006.01);
U.S. Cl.
CPC ...
F27D 21/0035 (2013.01); C21B 13/12 (2013.01); C21C 5/527 (2013.01); C21C 5/567 (2013.01); F27B 3/183 (2013.01); F27B 3/28 (2013.01); F27B 7/28 (2013.01); F27D 3/0024 (2013.01); F27D 3/0025 (2013.01); F27D 19/00 (2013.01); C21C 2005/5288 (2013.01); C21C 2300/02 (2013.01); C21C 2300/06 (2013.01); F27D 2019/0075 (2013.01); Y02P 10/20 (2015.11); Y02W 30/50 (2015.05);
Abstract

A system and equipment to measure and control the feeding of load material into an electrical arc furnace (EAF) includes an automatic control device feeding the load material; a measuring device positioned between the EAF and the tilting platform that includes an upper plate adapted to slide against the EAF, a lower plate engaged to the tilting platform, and a ring structure therebetween having a peripheral ring wall, a ring plate extending across the ring structure, and a contact member coupled to the ring plate that upperly contacts the upper plate and lowerly approaches, without contacting the lower plate; and one or more sensors measuring a deformation of the ring plate upon application of a load on the upper plate.


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