The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Apr. 20, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Anh N. Nguyen, Milpitas, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Mehmet Tugrul Samir, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45582 (2013.01); C23C 16/4558 (2013.01); C23C 16/45508 (2013.01); C23C 16/45512 (2013.01); C23C 16/45514 (2013.01); C23C 16/45559 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/45587 (2013.01); C23C 16/45591 (2013.01);
Abstract
Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of processing gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.