The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Aug. 16, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Petri Raisanen, Gilbert, AZ (US);
Ward Johnson, Gilbert, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01L 21/67 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4402 (2013.01); C23C 16/45553 (2013.01); C23C 16/45565 (2013.01); C23C 16/52 (2013.01); H01L 21/67017 (2013.01);
Abstract
A reaction system is disclosed that may be used to prevent formation of contaminants. The reaction system includes a showerhead that may be configured with a gated nanochannel grid to prevent particular gaseous precursors from passing through depending on whether a voltage is applied. The gated nanochannel grid may allow for both polar and non-polar molecules to pass, or may be configured to allow just non-polar or just polar molecules to pass.
Quick Actions:
Raisanen, Petri. (2020). Gas distribution device for a wafer processing apparatus (U.S. Patent No. 10829852). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10829852
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile