The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2020

Filed:

Jun. 28, 2017
Applicants:

Nof Corporation, Tokyo, JP;

The University of Tokyo, Tokyo, JP;

Inventors:

Kazuhiko Ishihara, Tokyo, JP;

Tomozumi Noda, Kawasaki, JP;

Masaru Matsuda, Kawasaki, JP;

Satoshi Yamada, Kawasaki, JP;

Nobuyuki Sakamoto, Kawasaki, JP;

Assignees:

NOF CORPORATION, Tokyo, JP;

THE UNIVERSITY OF TOKYO, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C10M 107/48 (2006.01); C08F 230/02 (2006.01);
U.S. Cl.
CPC ...
C10M 107/48 (2013.01); C08F 230/02 (2013.01); C10M 2225/025 (2013.01);
Abstract

Provided is a lubricity-imparting agent that can impart durable lubricity (in particular, lubricity at the time of wetting) to a substrate. It has been found that a lubricity-imparting agent including a copolymer containing a constitutional unit (A) based on 2-methacryloyloxyethyl phosphorylcholine and a constitutional unit (B) based on a photoreactive functional group-containing monomer, or a copolymer containing a constitutional unit (A) based on 2-methacryloyloxyethyl phosphorylcholine, a constitutional unit (B) based on a photoreactive functional group-containing monomer, and a constitutional unit (C) based on a hydrophobic group-containing monomer can impart durable lubricity to a substrate surface through a simple approach called photoirradiation.


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