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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10829665 B1

PDFFull Text
Date of Patent:
Nov. 10, 2020

Filed:

Jul. 12, 2018

Method of forming a self-cleaning film system

Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Gayatri V. Dadheech, Bloomfield Hills, MI (US);

Thomas A. Seder, Fraser, MI (US);

James A. Carpenter, Rochester Hills, MI (US);

Assignee:

GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Stefanie J Cohen

Int. Cl.
CPC ...
C09D 183/08 (2006.01); B01J 21/06 (2006.01); B01J 35/00 (2006.01); B01J 37/02 (2006.01); G03F 7/075 (2006.01); G03F 7/40 (2006.01); B05D 5/08 (2006.01); B01J 31/00 (2006.01); B01J 33/00 (2006.01); B01J 35/06 (2006.01); B05D 1/02 (2006.01); B05D 1/28 (2006.01); B01J 37/34 (2006.01); B05D 3/06 (2006.01); B05D 3/10 (2006.01); B05D 1/18 (2006.01);
U.S. Cl.
CPC ...
C09D 183/08 (2013.01); B01J 21/063 (2013.01); B01J 31/00 (2013.01); B01J 33/00 (2013.01); B01J 35/004 (2013.01); B01J 35/06 (2013.01); B01J 37/0217 (2013.01); B01J 37/0219 (2013.01); B01J 37/0228 (2013.01); B01J 37/0244 (2013.01); B05D 1/02 (2013.01); B05D 1/28 (2013.01); B05D 5/083 (2013.01); G03F 7/0752 (2013.01); G03F 7/40 (2013.01); B01J 37/0238 (2013.01); B01J 37/347 (2013.01); B05D 1/185 (2013.01); B05D 3/06 (2013.01); B05D 3/107 (2013.01); B05D 2506/15 (2013.01); B05D 2518/10 (2013.01);
Abstract

A method of forming a self-cleaning film system includes depositing a photocatalytic material onto a substrate to form a first layer. The method also includes disposing a photoresist onto the first layer and then exposing the photoresist to light so that the photoresist has a developed portion and an undeveloped portion. The method includes removing the undeveloped portion so that the developed portion protrudes from the first layer. After removing, the method includes depositing a perfluorocarbon siloxane polymer onto the first layer to surround and contact the developed portion. After depositing the perfluorocarbon siloxane polymer, the method includes removing the developed portion to thereby form the self-cleaning film system.

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