The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Oct. 03, 2018
Fujifilm Corporation, Tokyo, JP;
Miho Asahi, Kanagawa, JP;
Naoya Shibata, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method of manufacturing an antireflection film including, in the following order, a substrate, a hard coat layer and an antireflection layer as defined herein includes: applying a hard coat layer forming composition including a crosslinking compound having a weight-average molecular weight equal to or greater than 600, a compound having a molecular weight smaller than 600 and having a photopolymerizable group and a photopolymerization initiator, onto the substrate as defined herein; semi-curing the hard coat layer forming film; applying an antireflection layer forming composition including particles, a binder resin forming compound and a solvent, onto the semi-cured hard coat layer forming film as defined herein; causing a part of the binder resin forming compound to permeate the hard coat layer forming film as defined herein; and completely curing the hard coat layer forming film and the antireflection layer forming film as defined herein.