The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2020

Filed:

Jan. 25, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Naoki Murasato, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 35/02 (2006.01); G03F 7/00 (2006.01); B29C 35/08 (2006.01); B29C 59/02 (2006.01); H01L 21/67 (2006.01); H01L 21/3105 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
B29C 35/0288 (2013.01); B29C 35/0805 (2013.01); B29C 59/026 (2013.01); G03F 7/0002 (2013.01); H01L 21/31058 (2013.01); H01L 21/67092 (2013.01); H01L 21/67253 (2013.01); B29C 2035/0827 (2013.01); B29L 2031/34 (2013.01); H01L 21/67115 (2013.01);
Abstract

An imprint apparatus for forming a pattern in an imprint material on a substrate using an original as a mold, comprises an ultraviolet light generation device which irradiates with ultraviolet light which is curing light for curing the imprint material, and a control unit which controls a light amount of the ultraviolet light which is curing light. The control unit configured to perform a control of the light amount of the ultraviolet light acquires data of a defect distribution of the pattern formed on the substrate by the mold, and performs the control of the light amount of the ultraviolet light in a plurality of shot areas on the substrate based on the acquired data of the defect distribution.


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