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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10827137 B1

PDFFull Text
Date of Patent:
Nov. 03, 2020

Filed:

Mar. 24, 2016

Alignment method and system for manufacturing mask integration framework

Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Ordos Yuansheng Optoelectronics Co., Ltd., Ordos, Inner Mongolia, CN;

Inventor:

Xinjian Zhang, Beijing, CN;

Assignees:

BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;

ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Ordos, Inner Mongolia, CN;

Attorney:

Armstrong Teasdale LLP

Primary Examiner:

Pinalben Patel

Int. Cl.
CPC ...
H04N 5/345 (2011.01); G06K 9/46 (2006.01); C23C 14/04 (2006.01); G06K 9/34 (2006.01); G06K 9/48 (2006.01); G06K 9/00 (2006.01); G06K 9/38 (2006.01);
U.S. Cl.
CPC ...
H04N 5/3452 (2013.01); C23C 14/042 (2013.01); G06K 9/00355 (2013.01); G06K 9/342 (2013.01); G06K 9/38 (2013.01); G06K 9/4652 (2013.01); G06K 9/48 (2013.01);
Abstract

An alignment method for manufacturing a mask integration framework is disclosed. The alignment method includes establishing an absolute coordinate system by taking a center of a metal framework as an origin of coordinates, the center of the metal framework coinciding with a center of an array substrate serving as a reference, controlling the array substrate to move, such that an offset of coordinates of a pixel point under the absolute coordinate system with respect to a predetermined theoretical value is smaller than or equal to a predetermined error value, and transmitting the coordinates of the pixel point under the absolute coordinate system, after the array substrate moves, to a tension device. An alignment system for manufacturing mask integration framework is also disclosed.

Find Patent Forward Citations

Zhang, Xinjian. (2020). Alignment method and system for manufacturing mask integration framework (U.S. Patent No. 10827137). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10827137

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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