The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Oct. 25, 2018
Applicant:
Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, CN;
Inventor:
Chuan Wang, Shenzhen, CN;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1218 (2013.01); H01L 27/1262 (2013.01);
Abstract
The present disclosure provides an array substrate, a manufacturing method thereof and a display. By forming a source pattern layer on the base substrate in the present disclosure, the source pattern layer crossing the gate pattern layer maybe mutually insulated from the gate pattern layer through the insulating buffer layer, thus eliminating the dielectric layer in the prior art which is formed to insulate the source pattern layer and the gate pattern layer, further simplifying the structure of the array substrate, and reducing the process steps and process costs.