The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Sep. 11, 2018
Applicant:

Rohm Co., Ltd., Kyoto, JP;

Inventors:

Toshiyuki Kanaya, Kyoto, JP;

Tsuyoshi Hosono, Kyoto, JP;

Assignee:

ROHM CO., LTD., Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 27/07 (2006.01); H01L 27/11563 (2017.01); H01L 29/866 (2006.01); H01L 21/762 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 27/06 (2006.01); H01L 21/225 (2006.01); H01L 21/04 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0727 (2013.01); H01L 21/762 (2013.01); H01L 21/76224 (2013.01); H01L 27/0629 (2013.01); H01L 27/11563 (2013.01); H01L 29/10 (2013.01); H01L 29/66106 (2013.01); H01L 29/866 (2013.01); H01L 21/0465 (2013.01); H01L 21/2253 (2013.01); H01L 29/0615 (2013.01); H01L 29/0619 (2013.01); H01L 29/0646 (2013.01); H01L 29/0692 (2013.01);
Abstract

The semiconductor device includes a semiconductor layer having a main surface, a first semiconductor region of a first conductivity type formed in a surface layer portion of the main surface of the semiconductor layer, a second semiconductor region of a second conductivity type formed in a surface layer portion of the first semiconductor region and forming a zener diode with the first semiconductor region, a third semiconductor region of the first conductivity type formed in the surface layer portion of the first semiconductor region separated from the second semiconductor region, a fourth semiconductor region of the second conductivity type formed in a region between the second semiconductor region and the third semiconductor region in the surface layer portion of the first semiconductor region and having a second conductivity type impurity concentration less than a second conductivity type impurity concentration of the second semiconductor region, and an insulating layer formed on the main surface of the semiconductor layer and covering the second semiconductor region, the third semiconductor region and the fourth semiconductor region.


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