The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Jan. 14, 2019
Applicant:
Exogenesis Corporation, Billerica, MA (US);
Inventors:
Sean R. Kirkpatrick, Littleton, MA (US);
Allen R. Kirkpatrick, Carlisle, MA (US);
Michael J. Walsh, Billerica, MA (US);
Richard C. Svrluga, Cambridge, MA (US);
Assignee:
Exogenesis Corporation, Billerica, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01L 21/02 (2006.01); H01L 21/265 (2006.01); H01L 21/311 (2006.01); H01L 21/321 (2006.01); C03C 23/00 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01); H01J 37/147 (2006.01); H01L 29/167 (2006.01); H01L 29/36 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2652 (2013.01); C03C 23/005 (2013.01); H01J 37/05 (2013.01); H01J 37/08 (2013.01); H01J 37/147 (2013.01); H01J 37/3171 (2013.01); H01L 21/02115 (2013.01); H01L 21/02238 (2013.01); H01L 21/02274 (2013.01); H01L 21/26506 (2013.01); H01L 21/26513 (2013.01); H01L 21/26566 (2013.01); H01L 21/31116 (2013.01); H01L 21/32115 (2013.01); H01L 29/167 (2013.01); C03C 2204/08 (2013.01); H01J 37/317 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/0812 (2013.01); H01J 2237/15 (2013.01); H01J 2237/31701 (2013.01); H01L 21/324 (2013.01); H01L 29/36 (2013.01); Y10T 428/24355 (2015.01); Y10T 428/24479 (2015.01); Y10T 428/30 (2015.01);
Abstract
A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.
Quick Actions:
Kirkpatrick, Sean. (2020). Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby (U.S. Patent No. 10825685). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10825685
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile