The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Mar. 23, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Heechul Yang, Suwon-si, KR;

Jongseok Lee, Suwon-si, KR;

Youngo Park, Suwon-si, KR;

Kwangpyo Choi, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 3/40 (2006.01); G06N 3/04 (2006.01); G06F 7/544 (2006.01);
U.S. Cl.
CPC ...
G06T 3/4046 (2013.01); G06F 7/5443 (2013.01); G06N 3/0454 (2013.01); G06T 2207/20024 (2013.01); G06T 2207/20084 (2013.01);
Abstract

Provided are methods and apparatus related to Artificial Intelligence (AI) downscaling and upscaling and techniques related to reducing artifact problems. Some embodiments include down-scaling an original image through a Deep Neural Network (DNN); generating, from the original image and based on frequency transform coefficients, artifact information representing a region in the first image including an artifact in the first image. Post-processing may be performed based on the artifact information to change pixels in the first image, thus reducing the effect of artifacts.


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