The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Sep. 18, 2018
Advanced Micro-fabrication Equipment Inc, Shanghai, Shanghai, CN;
Xiaoming He, Shanghai, CN;
Shiping Guo, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA, Shanghai, CN;
Abstract
A method to improve the MOCVD reaction by protection film on the stainless steel body in the MOCVD reaction chamber. The film is composed of the elements of the gas required during the MOCVD deposition process, or the elements that will not react with the reaction gases of MOCVD. The film is a compound of at least one of Al, Ga and Mg and at least one of oxygen or nitrogen, or other materials with stable chemical characteristics that will not react with the gases in the MOCVD process. The film could reduce the initialization time of the MOCVD process, and improve the efficiency of the MOCVD equipment. The protection film has compact organization with porosity of less than 1%, and thickness of 1 nm to 0.5 mm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile