The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Jul. 21, 2016
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Axel Kirste, Limburgerhof, DE;
Tobias Urban, Bensheim, DE;
Fabio Nicolini, Mutterstadt, DE;
Simone Lutter, Ludwigshafen, DE;
Frank Richter, Frankenthal, DE;
Andre Cezanne, Cologne, DE;
Assignee:
BASF SE, Ludwigshafen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C23C 28/02 (2006.01); C23C 18/20 (2006.01); C23C 18/26 (2006.01); C25D 5/56 (2006.01); C08J 7/06 (2006.01); C23C 18/30 (2006.01); C08J 7/12 (2006.01); C23C 18/16 (2006.01); C23C 18/34 (2006.01); C23C 18/40 (2006.01); C25D 3/04 (2006.01); C25D 3/12 (2006.01); C25D 3/38 (2006.01); C25D 5/54 (2006.01);
U.S. Cl.
CPC ...
C23C 18/2086 (2013.01); C08J 7/06 (2013.01); C08J 7/12 (2013.01); C23C 18/1641 (2013.01); C23C 18/1653 (2013.01); C23C 18/26 (2013.01); C23C 18/30 (2013.01); C23C 18/34 (2013.01); C23C 18/40 (2013.01); C23C 28/023 (2013.01); C25D 3/04 (2013.01); C25D 3/12 (2013.01); C25D 3/38 (2013.01); C25D 5/54 (2013.01); C25D 5/56 (2013.01); C08J 2355/02 (2013.01);
Abstract
The invention relates to a process for coating plastics or plastic surfaces with metals, especially plastics composed of acrylonitrile/butadiene/styrene copolymers (ABS) and composed of mixtures of these copolymers with other plastics (e.g. ABS blends), wherein the process comprises the pretreatment of the plastic surfaces with a composition C (etch solution) comprising at least two different ionic liquids IL1 and IL2.