The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Aug. 17, 2018
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Sukjin Chung, Hwaseong-si, KR;

Bongjin Kuh, Suwon-si, KR;

Kook Tae Kim, Hwaseong-si, KR;

In-Sun Yi, Seoul, KR;

Soojin Hong, Guri-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4408 (2013.01); C23C 16/4404 (2013.01); C23C 16/4405 (2013.01); C23C 16/4584 (2013.01); C23C 16/45578 (2013.01);
Abstract

Disclosed are a substrate processing apparatus and a method of cleaning the apparatus. The apparatus includes a process chamber, a support unit in the process chamber and configured to support a substrate, and a gas injection unit in the process chamber. The gas injection unit includes a first injection portion configured to inject a source gas, a second injection portion facing the first injection portion and configured to inject a reaction gas that reacts with the source gas, and a third injection portion configured to inject a cleaning gas that removes a reactant produced from the source gas and the reaction gas.


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