The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Mar. 14, 2017
Applicant:

Agc Inc., Tokyo, JP;

Inventors:

Tetsushi Takiguchi, Tokyo, JP;

Shunji Inoue, Tokyo, JP;

Kazutaka Ono, Tokyo, JP;

Hirofumi Tokunaga, Tokyo, JP;

Jun Akiyama, Tokyo, JP;

Yasumasa Kato, Tokyo, JP;

Taketoshi Taniguchi, Tokyo, JP;

Assignee:

AGC INC., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); C03C 3/091 (2006.01); C03B 17/06 (2006.01); C03B 25/08 (2006.01); C03B 18/02 (2006.01);
U.S. Cl.
CPC ...
C03C 3/091 (2013.01); C03B 17/06 (2013.01); C03B 25/08 (2013.01); C03B 18/02 (2013.01); Y02P 40/57 (2015.11); Y10T 428/30 (2015.01);
Abstract

The present invention relates to an alkali-free glass substrate, in which when two arbitrary sites in one main surface thereof are selected, an absolute value of a difference between a thermal shrinkage ratio in an arbitrary direction at one site and a thermal shrinkage ratio in a direction orthogonal to the arbitrary direction at another site is 2 ppm or less, provided that the thermal shrinkage ratio is calculated by measuring a deformation amount in a measuring direction of the glass substrate between before and after a heat treatment of raising a temperature from normal temperature to 600° C. at 100° C./hour, holding the glass substrate at 600° C. for 80 minutes, and lowering the temperature from 600° C. to normal temperature at 100° C./hour.


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