The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2020

Filed:

Feb. 13, 2020
Applicant:

Memjet Technology Limited, Dublin, IE;

Inventors:

Angus North, Sydney, AU;

Ronan O'Reilly, Dublin, IE;

Gregory McAvoy, Dublin, IE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00611 (2013.01); B41J 2/1603 (2013.01); B41J 2/1628 (2013.01); B41J 2/1631 (2013.01); B41J 2/1639 (2013.01); B41J 2/1645 (2013.01); B81B 2201/052 (2013.01); B81B 2203/0353 (2013.01); B81C 2201/0104 (2013.01); B81C 2201/0121 (2013.01);
Abstract

A process for forming inkjet nozzle devices on a frontside surface of a wafer substrate. The process includes the steps of: (i) providing the wafer substrate having a plurality of etched holes defined in the frontside surface, each etched hole being filled with first and second polymers such that the second polymer is coplanar with the frontside surface; (ii) forming the inkjet nozzle devices on the frontside surface using MEMS fabrication steps; and (iii) removing the first and second polymers via oxidative ashing, wherein first and second polymers are different.


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