The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

May. 23, 2018
Applicant:

Soitec, Bernin, FR;

Inventors:

Marcel Broekaart, Theys, FR;

Frederic Allibert, Grenoble, FR;

Eric Desbonnets, Lumbin, FR;

Jean-Pierre Raskin, Louvain-la-Neuve, BE;

Martin Rack, Louvain-la-Neuve, BE;

Assignee:

Soitec, Bernin, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/66 (2006.01); H03C 7/00 (2006.01);
U.S. Cl.
CPC ...
H03C 7/00 (2013.01); H01L 23/66 (2013.01); H01L 2223/6661 (2013.01); H03C 2200/0079 (2013.01);
Abstract

A method for minimizing harmonic distortion and/or intermodulation distortion of a radiofrequency signal propagating in a radiofrequency circuit formed on a semiconductor substrate coated with an electrically insulating layer, wherein a curve representing the distortion as a function of a power of the input or output signal exhibits a trough around a given power (P), the method comprises applying, between the radiofrequency circuit and the semiconductor substrate, an electrical potential difference (V) chosen so as to move the trough toward a given operating power of the radiofrequency circuit.


Find Patent Forward Citations

Loading…