The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Oct. 22, 2019
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Ping Mei, San Jose, CA (US);
Robert A. Street, Palo Alto, CA (US);
Gregory L. Whiting, Menlo Park, CA (US);
Sivkheng Kor, San Jose, CA (US);
Steven E. Ready, Los Altos, CA (US);
Assignee:
PALO ALTO RESEARCH CENTER INCORPORATED, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 27/28 (2006.01); H01L 51/10 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0022 (2013.01); H01L 27/283 (2013.01); H01L 51/105 (2013.01);
Abstract
A method and system utilizes ink jetting or printing of surface work function modification material or solution to form modified p-type and/or n-type electrodes. The proposed method is suitable for making complementary OTFT circuits in roll-to-roll fabrication environment.