The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Apr. 24, 2018
Globalfoundries Inc., Grand Cayman, KY;
Vibhor Jain, Essex Junction, VT (US);
Pernell Dongmo, Essex Junction, VT (US);
Cameron Luce, Colchester, VT (US);
James W. Adkisson, Jericho, VT (US);
Qizhi Liu, Lexington, MA (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Fabrication methods and device structures for a heterojunction bipolar transistor. A trench isolation region is formed that surrounds an active region of semiconductor material, a collector is formed in the active region, and a base layer is deposited that includes a first section over the trench isolation region, a second section over the active region, and a third section over the active region that connects the first section and the second section. An emitter is arranged over the second section of the base layer, and an extrinsic base layer is arranged over the first section of the base layer and the third section of the base layer. The extrinsic base layer includes a first section containing polycrystalline semiconductor material and a second section containing single-crystal semiconductor material. The first and second sections of the extrinsic base layer intersect along an interface that extends over the trench isolation region.