The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Aug. 30, 2018
Applicant:
Murata Machinery, Ltd., Kyoto-fu, JP;
Inventors:
Assignee:
MURATA MACHINERY, LTD., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67389 (2013.01); H01L 21/67326 (2013.01); H01L 21/67346 (2013.01);
Abstract
Carrier, container or other system that provides a separation and protection for substrates, wafers, etc. for before, during or after processing or storage through the use of a membrane integral to the carrier or container respectively. This includes for use with Tec-Cell systems with high and low density configurations as well as other standardized systems, such as FOUPs. Includes protection for contamination brakeage chafing, through isolation and containment. Additional features are included such as the membrane providing guides or otherwise increasing efficiency or presence of airflow, such as laminar airflow over each substrate, wafer, etc. being held.