The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Jun. 22, 2018
Applicants:

Cnh Industrial Canada, Ltd., Saskatoon, CA;

Autonomous Solutions, Inc., Mendon, UT (US);

Inventors:

Luca Ferrari, Modena, IT;

Taylor C. Bybee, Logan, UT (US);

Assignees:

CNH Industrial Canada, Ltd., Saskatoon, Saskatchewan, CA;

Autonomous Solutions, Inc., Mendon, UT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06F 19/00 (2018.01); G06K 9/62 (2006.01); G06K 9/66 (2006.01); A01B 76/00 (2006.01); A01B 63/14 (2006.01); A01B 49/02 (2006.01);
U.S. Cl.
CPC ...
G06K 9/6268 (2013.01); A01B 63/14 (2013.01); A01B 76/00 (2013.01); G06K 9/00657 (2013.01); G06K 9/628 (2013.01); G06K 9/6284 (2013.01); G06K 9/66 (2013.01); A01B 49/02 (2013.01);
Abstract

The present disclosure provides systems and methods that measure crop residue in a field from imagery of the field. In particular, the present subject matter is directed to systems and methods that include or otherwise leverage a machine-learned crop residue classification model to determine a crop residue parameter value for a portion of a field based at least in part on imagery of such portion of the field captured by an imaging device. Furthermore, principal components analysis, such as projecting image patches onto Eigen-images, can be performed to reduce the dimensionality of the feature vector provided to the classification model.


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