The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Dec. 10, 2018
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Ansas Matthias Kasten, Schenectady, NY (US);

William Albert Challener, Glenville, NY (US);

Assignee:

GENERAL ELECTRIC COMPANY, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/00 (2006.01); G01N 21/31 (2006.01); G05D 1/00 (2006.01);
U.S. Cl.
CPC ...
G01N 33/0027 (2013.01); G01N 21/31 (2013.01); G05D 1/0094 (2013.01);
Abstract

A gas analysis system includes a scanning platform configured to direct a plurality of light beams over a target area. The scanning platform includes emitter spectroscopy assembly configured to emit the plurality of light beams toward respective target surfaces of the target area, receive a plurality of reflected light beams from the respective target surfaces, and determine a spectral intensity of each reflected light beam of the plurality of reflected light beams. Moreover, the scanning platform includes a main controller receive the feedback from the spectroscopy assembly indicative of the spectral intensity of each reflected light beam of the plurality of reflected light beams and determine a volumetric characterization of a gas plume based at least in part on the spectral intensity of a reflected light beam of the plurality of reflected light beams.


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