The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Feb. 08, 2017
Applicants:

Vg Systems Limited, Altrincham, GB;

Thermo Electron Scientific Instruments Llc, Madison, WI (US);

Inventors:

Timothy Sion Nunney, Reigate, GB;

Christopher Kenneth Glenister, Lewes, GB;

Matthew Wayne Meyer, Madison, WI (US);

Noah Hibbard, Milwaukee, WI (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01); G01J 3/02 (2006.01); G01J 3/40 (2006.01); G01J 3/44 (2006.01); G01N 21/47 (2006.01); G01N 23/2273 (2018.01); G01N 21/17 (2006.01);
U.S. Cl.
CPC ...
G01N 21/65 (2013.01); G01J 3/0286 (2013.01); G01J 3/0291 (2013.01); G01J 3/40 (2013.01); G01J 3/44 (2013.01); G01J 3/4412 (2013.01); G01N 21/47 (2013.01); G01N 23/2273 (2013.01); G01N 2021/177 (2013.01); G01N 2021/1734 (2013.01);
Abstract

A process of analyzing a sample by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) includes providing a sample having a sample surface within a vacuum chamber, performing a Raman spectroscopic analysis on a plurality of selected areas of the sample surface within the vacuum chamber to map an area of the sample surface comprising the selected areas, the Raman spectroscopic analysis including identifying one or more face in one or more of the selected areas of the sample surface, and performing an X-ray photoelectron spectroscopy (XPS) analysis of one or more selected areas of the sample surface containing at least one chemical and/or structural feature identified by the Raman spectroscopic analysis, wherein the duration of the XPS analysis of a given selected area of the sample surface is longer than the duration of the Raman spectroscopic analysis of that given selected area.


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