The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Jul. 28, 2016
Hitachi High-tech Corporation, Minato-ku, Tokyo, JP;
Hiroki Kawada, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
A pattern measurement method and device realize high-precision measurement of a pattern in a depth direction. The method includes forming an inclined plane in a sample region having a deep hole, a deep groove, or a three-dimensional structure, setting the field of view of a scanning electron microscope to include a boundary between the inclined plane and the sample surface, acquiring an image based on a detection signal, specifying a first position which is the boundary between the inclined plane and a non-inclined plane and a second position which is the position of a desired deep hole or deep groove positioned in the inclined plane, and calculating the height-direction dimension of a pattern constituting the circuit element having the deep hole, deep groove, or three-dimensional structure based on a dimension in the sample surface direction between the first position and the second position and the angle of the inclined plane.