The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Mar. 20, 2017
Lpe S.p.a., Baranzate, IT;
Vincenzo Ogliari, Baranzate, IT;
Silvio Preti, Baranzate, IT;
LPE S.P.A., Baranzate (MI), IT;
Abstract
The susceptor for an epitaxial deposition reactor comprises a disc-shaped portion () which is adapted to be placed horizontally and which at the top has at least one cylindrical pocket () where a substrate () to be subjected to an epitaxial deposition process is placed; the pocket () has a bottom; one or more conduits () fluidically connected to an intake system () open on the bottom of the pocket (); when a substrate () is placed on the bottom of the pocket () and the intake system () is active, the substrate () remains adhering to the bottom of the pocket (). In particular: the upper body) superiorly has the pocket (), the conduits () vertically cross only the upper body (), the conduits () are fluidically connected to a plenum () located between the lower body () and the upper body () below the pocket (), the plenum () is fluidically connected to the intake system (); whereby when a substrate () is placed on the bottom of the pocket () and the intake system () is active, the lower body () and the upper body () remain united.