The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Sep. 11, 2018
Applicants:

SK Innovation Co., Ltd., Seoul, KR;

SK Global Chemical Co., Ltd., Seoul, KR;

SK IE Technology Co., Ltd., Seoul, KR;

Inventors:

Hyeon Jeong Kim, Daejeon, KR;

Sang Yoon Park, Daejeon, KR;

Tae Sug Jang, Daejeon, KR;

Jin Hyung Park, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/14 (2006.01); C08L 79/08 (2006.01); C08G 73/10 (2006.01); G02F 1/00 (2006.01);
U.S. Cl.
CPC ...
C08L 79/08 (2013.01); C08G 73/1007 (2013.01); C08G 73/1039 (2013.01); C08G 73/1042 (2013.01); C08G 73/1067 (2013.01); C08G 73/14 (2013.01); G02F 1/0063 (2013.01); C08L 2203/16 (2013.01); G02F 2203/01 (2013.01);
Abstract

Provided are a polyamic acid resin derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride, and a polyamideimide film including polyamideimide derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride.


Find Patent Forward Citations

Kim, Hyeon. (2020). Polyamic acid resin and polyamideimide film (U.S. Patent No. 10815378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10815378

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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