The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2020
Filed:
Aug. 08, 2017
Applicants:
Akita University, Akita-shi, Akita, JP;
Daikin Industries, Ltd., Osaka-shi, Osaka, JP;
Inventors:
Kazuya Matsumoto, Akita, JP;
Mitsutoshi Jikei, Akita, JP;
Sumito Yamakawa, Akita, JP;
Tadatake Sakurada, Akita, JP;
Fumihiro Kamiya, Osaka, JP;
Tsuyoshi Noguchi, Osaka, JP;
Assignees:
Akita University, Akita, JP;
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 27/18 (2006.01); C08L 27/12 (2006.01); C08L 77/00 (2006.01); C09K 3/10 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C08L 27/18 (2013.01); C08L 27/12 (2013.01); C08L 77/00 (2013.01); C09K 3/1009 (2013.01); H01J 37/32513 (2013.01); H01L 21/67069 (2013.01); C08L 2312/00 (2013.01); C09K 2200/0637 (2013.01); C09K 2200/0685 (2013.01);
Abstract
The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against oxygen plasma exposure and fluorine plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a hyperbranched polymer of a cage silsesquioxane with a specific structure.