The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

May. 30, 2017
Applicant:

Textile Rubber and Chemical Company, Inc., Dalton, GA (US);

Inventors:

Larry E Mashburn, Dalton, GA (US);

Giuseppe V Tambasco, Marietta, GA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/06 (2006.01); D05C 17/02 (2006.01); C09D 123/04 (2006.01);
U.S. Cl.
CPC ...
C08L 23/06 (2013.01); C09D 123/04 (2013.01); D05C 17/02 (2013.01); B32B 2262/0215 (2013.01); C08L 2203/30 (2013.01);
Abstract

The invention comprises a method of making synthetic turf. The method comprises applying a plurality of solid polyethylene polymer particles to a tufted primary backing of a tufted synthetic turf to form a coating thereon, wherein the solid polyethylene polymer particles have an average particle size of approximately 1 to approximately 1,000 microns and a melt index of approximately 50 to approximately 500 grams/10 minutes at 190° C. at a weight of 2.16 kg. and wherein the primary backing is tufted with a plurality of synthetic filaments to form a plurality of synthetic filaments extending outwardly from the side of the synthetic turf opposite the primary backing. The method also comprises heating the solid polyethylene particles to a temperature above their melting point so that the solid polyethylene polymer particles melt and at least partially flow into the primary backing and cooling the polyethylene polymer on the primary backing. A product made by the foregoing process is also disclosed.


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