The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Sep. 12, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Shafaat Ahmed, Yorktown Heights, NY (US);

Hariklia Deligianni, Tenafly, NJ (US);

Lubomyr T. Romankiw, Briancliff Manor, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 31/032 (2006.01); H01L 31/0392 (2006.01); H01L 31/0749 (2012.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
H01L 31/022441 (2013.01); H01L 31/022425 (2013.01); H01L 31/032 (2013.01); H01L 31/0322 (2013.01); H01L 31/0326 (2013.01); H01L 31/03923 (2013.01); H01L 31/0749 (2013.01); B82Y 30/00 (2013.01); Y02E 10/541 (2013.01);
Abstract

A chalcogen-resistant material including at least one of a conductive elongated nanostructure layer and a high work function material layer is deposited on a transition metal layer on a substrate. A semiconductor chalcogenide material layer is deposited over the chalcogen-resistant material. The conductive elongated nanostructures, if present, can reduce contact resistance by providing direct electrically conductive paths from the transition metal layer through the chalcogen-resistant material and to the semiconductor chalcogenide material. The high work function material layer, if present, can reduce contact resistance by blocking chalcogenization of the transition metal in the transition metal layer. Reduction of the contact resistance can enhance efficiency of a solar cell including the chalcogenide semiconductor material.


Find Patent Forward Citations

Loading…