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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10811237 B1

PDFFull Text
Date of Patent:
Oct. 20, 2020

Filed:

Nov. 02, 2016

Mn—zn—o sputtering target and production method therefor

Applicant:

Dexerials Corporation, Shinagawa-ku, Tokyo, JP;

Inventors:

Junichi Sugawara, Tome, JP;

Yuichi Kamori, Tome, JP;

Assignee:

Dexerials Corporation, Shinagawa-ku, Tokyo, JP;

Attorney:

Kenja IP Law PC

Primary Examiner:

Jason Berman

Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C04B 35/453 (2006.01); C04B 35/645 (2006.01); G11B 7/243 (2013.01); C04B 35/626 (2006.01); C23C 14/08 (2006.01); G11B 7/241 (2006.01); C04B 35/64 (2006.01); G11B 7/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C04B 35/453 (2013.01); C04B 35/62635 (2013.01); C04B 35/64 (2013.01); C04B 35/645 (2013.01); C04B 35/6455 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); C23C 14/086 (2013.01); C23C 14/3414 (2013.01); G11B 7/241 (2013.01); G11B 7/243 (2013.01); C04B 2235/3256 (2013.01); C04B 2235/3258 (2013.01); C04B 2235/3263 (2013.01); C04B 2235/3268 (2013.01); C04B 2235/3284 (2013.01); C04B 2235/404 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/656 (2013.01); C04B 2235/72 (2013.01); C04B 2235/77 (2013.01); G11B 7/266 (2013.01); G11B 2007/2432 (2013.01); G11B 2007/24304 (2013.01); G11B 2007/24306 (2013.01);
Abstract

Provided is a Mn—Zn—O sputtering target which can be used in DC sputtering, and a production method for the target. The Mn—Zn—O sputtering target comprises a chemical composition containing Mn, Zn, O, and at least one element X, the element X being a single one or two elements selected from the group consisting of W and Mo. The target has a relative density of 90% or more and a specific resistance of 1×10Ω·cm or less.

Find Patent Forward Citations

Sugawara, Junichi. (2020). Mn—zn—o sputtering target and production method therefor (U.S. Patent No. 10811237). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10811237

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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