The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Nov. 28, 2016
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Thomas Theodor Koetter, Berlin, DE;

Thomas Simenec, Berlin, DE;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/00 (2019.01); G06F 11/34 (2006.01); H04L 29/08 (2006.01); G06F 16/25 (2019.01); G06F 16/27 (2019.01);
U.S. Cl.
CPC ...
G06F 11/3433 (2013.01); G06F 16/256 (2019.01); G06F 16/27 (2019.01); H04L 67/1095 (2013.01); G06F 2201/80 (2013.01); G06F 2201/87 (2013.01);
Abstract

A computer implemented method for extended monitoring of a database includes establishing a data virtualization communications connection between a first and a second datacenter that is a copy of the first datacenter. Requests for monitoring information corresponding to the first datacenter are made by accessing its system views. Requests for monitoring information corresponding to the second datacenter are made by generating virtual tables on the first datacenter to provide the system views of the second datacenter to the first datacenter and accessing the virtual tables. The monitoring information corresponding to the first datacenter is grouped into a first schema on the first datacenter and the monitoring information corresponding to the second datacenter is grouped into a second schema, separate from the first schema. A union view is generated by combining the monitoring data associated with the two datacenters. Related apparatus, systems, techniques and articles are also described.


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