The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jan. 09, 2018
Lg Chem, Ltd., Seoul, KR;
Junyoung Lee, Daejeon, KR;
Jong Hyuk Park, Daejeon, KR;
Jun Won Choi, Daejeon, KR;
Chang Hun Yu, Daejeon, KR;
Ye Hoon Im, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
A selective catalytic reduction (SCR) system having a catalytic layer. The SCR includes a plurality of baffle members located in a position spaced apart from a front end of the catalytic layer, the plurality of baffle members reduces a flow deviation due to enlargement of a flow cross-section of a fluid in at least one direction, each of the plurality of baffle members includes a first part and a second part, the first part and the second part of each of the plurality of baffle members extends in an orthogonal direction with respect to the at least one direction of enlargement of the flow cross-section, the first part and the second part are integrated, and each of the plurality of baffle members protrudes in an inlet direction of the fluid.