The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Jan. 16, 2017
Diarotech S.a., Gilly, BE;
Horacio J. Tellez Oliva, Charleroi, BE;
Alain Roch, Le Roeulx, BE;
Etienne Lamine, Court-Saint-Etienne, BE;
DIAROTECH S.A., Gilly, BE;
Abstract
The method involves a substratenear which reagentsare provided. Pump () and Raman () photons make it possible to create a stimulated Raman emission during the synthesis () of the material. The Raman emission can be Stokes or anti-Stokes. In one embodiment of the invention, the zone where the synthesis () occurs is in an optical cavity and Raman photons () emitted by the Raman emission are reoriented toward the zone where the synthesis () occurs. In another embodiment of the invention, the zone where the synthesis () occurs is not in an optical cavity, and a stream of Raman photons () is created in an outside optical cavity before being sent toward the zone where the synthesis () occurs. The synthesis () preferably involves a CVD method or solidification by the Czochralski method.