The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Dec. 20, 2017
Applicant:

Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;

Inventors:

Christian Schenk, Ingelheim, DE;

Gerrit Scheich, Seligenstadt, DE;

Nadine Tscholitsch, Hanau, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 19/06 (2006.01); C03C 3/06 (2006.01); C03C 1/00 (2006.01);
U.S. Cl.
CPC ...
C03B 19/066 (2013.01); C03C 1/006 (2013.01); C03C 3/06 (2013.01); C03B 2201/02 (2013.01); C03C 2201/80 (2013.01);
Abstract

In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiOparticles and coarse SiOreinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density Dare here embedded in a SiOmatrix with a specific glass density D. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density Dof which prior to the sintering treatment is lower than the specific glass density D, and which due to the sintering treatment reach the specific density Dwhich differs from the specific glass density Dby less than 10%.


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