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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10807109 B1

PDFFull Text
Date of Patent:
Oct. 20, 2020

Filed:

Dec. 19, 2017

Deposition of particles at desired locations using plasmonic enhancement

Applicant:

U.s. Army Research Laboratory Attn: Rdrl-loc-i, Adelphi, MD (US);

Inventors:

David R. Baker, Alexandria, VA (US);

Joshua P. McClure, Alexandria, VA (US);

Kyle N. Grew, Elkridge, MD (US);

Assignee:

The United States of America as represented by the Secretary of the Army, Washington, DC (US);

Attorney:

Emily Christine Moscati

Primary Examiner:

Michael P Wieczorek

Int. Cl.
CPC ...
C23C 16/48 (2006.01); C23C 14/00 (2006.01); B05D 1/38 (2006.01); B05B 5/08 (2006.01); G01N 21/65 (2006.01); H01L 27/144 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B05B 5/088 (2013.01); B05D 1/38 (2013.01); C23C 14/00 (2013.01); C23C 16/48 (2013.01); G01N 21/658 (2013.01); H01L 27/1446 (2013.01); G03F 7/0002 (2013.01);
Abstract

Plasmonically enhanced electric fields are used to deposit particles at selected locations through decomposition or electron transfer reactions with precursor molecules in gas or liquid phase. The location of the enhanced electric fields is controlled through a combination of plasmonic substrate structure shape, material, incident light wavelength and polarization. The particles are deposited at designated locations only, whereby no deposition occurs at locations lacking enhanced electric fields. Many reaction variables can be used to change the rate of particle deposition such as precursor molecules, exposure time, precursor concentration, and temperature making for a highly customizable reaction space.

Find Patent Forward Citations

Baker, David. (2020). Deposition of particles at desired locations using plasmonic enhancement (U.S. Patent No. 10807109). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10807109

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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