The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Jun. 15, 2017
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Ki Youl Yoon, Daejeon, KR;

Hyo Sook Joo, Daejeon, KR;

Gi Cheul Kim, Daejeon, KR;

Hyeon Choi, Daejeon, KR;

Ju Eun Kim, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 20/26 (2006.01); B01J 20/10 (2006.01); B01J 20/28 (2006.01); C08K 3/40 (2006.01); C08K 3/24 (2006.01); C08K 7/28 (2006.01); C08J 3/24 (2006.01); C08J 3/12 (2006.01); C08F 20/06 (2006.01); C08J 3/075 (2006.01); C08L 33/02 (2006.01); B01J 20/30 (2006.01);
U.S. Cl.
CPC ...
B01J 20/267 (2013.01); B01J 20/10 (2013.01); B01J 20/28004 (2013.01); B01J 20/28011 (2013.01); B01J 20/28021 (2013.01); B01J 20/28026 (2013.01); B01J 20/28047 (2013.01); B01J 20/3021 (2013.01); B01J 20/3085 (2013.01); C08F 20/06 (2013.01); C08J 3/075 (2013.01); C08J 3/12 (2013.01); C08J 3/24 (2013.01); C08K 3/40 (2013.01); C08K 7/28 (2013.01); C08L 33/02 (2013.01); C08J 2333/02 (2013.01); C08J 2333/18 (2013.01);
Abstract

The present invention relates to a super absorbent polymer having a controlled degree of internal crosslinking and thereby having simultaneously improved basic absorption capacity and absorbency under pressure, and a method for producing the same. The super absorbent polymer may comprise a base polymer powder including a cross-linked polymer of a monomer containing a water-soluble ethylenically unsaturated compound or its salt; and a surface cross-linked layer that is formed on the base polymer powder and is further cross-linked from the cross-linked polymer, wherein a glass hollow particle having a micron-scale particle size is included in the cross-linked structure of the cross-linked polymer of the base polymer powder.


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