The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Oct. 11, 2018
Applicant:

Kureha Corporation, Tokyo, JP;

Inventors:

Hiroshi Sakabe, Tokyo, JP;

Michihisa Miyahara, Tokyo, JP;

Kenji Suzuki, Tokyo, JP;

Assignee:

KUREHA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/06 (2006.01); C08G 75/20 (2016.01); C08G 75/025 (2016.01); B01J 19/00 (2006.01); C08G 65/40 (2006.01); B01J 19/18 (2006.01); B01J 19/24 (2006.01);
U.S. Cl.
CPC ...
B01J 19/006 (2013.01); B01J 19/1881 (2013.01); B01J 19/2465 (2013.01); C08G 65/4031 (2013.01); C08G 65/4093 (2013.01); C08G 75/025 (2013.01); C08G 75/20 (2013.01); B01J 2219/00033 (2013.01); B01J 2219/00038 (2013.01); B01J 2219/00051 (2013.01); B01J 2219/1923 (2013.01);
Abstract

Provided is a continuous production apparatus and a continuous production method capable of preventing the countercurrent of evaporation components generated at the time of polymerization so that continuous solution polymerization reactions can progress reliably. A continuous production apparatus () includes a housing chamber () configured to house a plurality of reaction vessels (to); wherein a reaction mixture is formed by subjecting monomers to a polymerization reaction in a solvent in at least one of the reaction vessels; the reaction vessels communicate with one another via a gas phase part (); the reaction vessels are sequentially connected; the reaction mixture successively moves to each of the reaction vessels; and the housing chamber includes a baffle () configured to narrow the cross-sectional area of the gas phase part at the boundary between at least one pair of adjacent reaction vessels or in the vicinity of the boundary.


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