The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

May. 08, 2017
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Eun Jeong Kim, Daejeon, KR;

Kwang Hyun Yoo, Daejeon, KR;

Ye Hoon Im, Daejeon, KR;

Jin Yeong Lee, Daejeon, KR;

Won Jong Kwon, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 3/00 (2006.01); B01F 13/00 (2006.01); B01J 3/06 (2006.01); B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
B01J 3/002 (2013.01); B01F 13/0061 (2013.01); B01J 3/062 (2013.01); B01J 19/0093 (2013.01); B01J 2203/061 (2013.01); B01J 2219/0086 (2013.01); B01J 2219/00792 (2013.01); B01J 2219/00889 (2013.01);
Abstract

The present invention relates to a high pressure homogenizer and a method for manufacturing graphene using the same, and according to one aspect of the present invention, there is provided a high pressure homogenizer comprising a channel module which comprises a microchannel through which an object for homogenization passes, wherein the channel module comprises at least one baffle disposed so as to partition the microchannel into a plurality of spaces and the baffle is provided so as to partition the microchannel into two spaces along the width direction or the height direction.


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