The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Mar. 31, 2016
Applicant:
Asahi Kasei Kabushiki Kaisha, Tokyo, JP;
Inventors:
Tetsuko Takahashi, Tokyo, JP;
Junichi Kojima, Tokyo, JP;
Assignee:
Asahi Kasei Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/07 (2013.01); D03D 3/02 (2006.01); D03D 1/00 (2006.01); D03D 15/00 (2006.01); A61L 17/10 (2006.01); A61L 31/06 (2006.01);
U.S. Cl.
CPC ...
A61F 2/07 (2013.01); A61L 17/10 (2013.01); A61L 17/105 (2013.01); A61L 31/06 (2013.01); D03D 1/00 (2013.01); D03D 3/02 (2013.01); D03D 15/00 (2013.01); A61F 2002/075 (2013.01); A61F 2220/0075 (2013.01); D10B 2331/04 (2013.01); D10B 2509/06 (2013.01);
Abstract
A low-profile stent graft has a Type-III endoleak suppression effect, avoiding the problem with a stent graft which uses an extra-thin graft incurring enlarged needle holes or needle hole parts in a suture part. The stent graft has a proximate end, a distal end, and a lumen which is positioned between the proximate end and the distal end. The stent graft is formed by coupling a cylindrical graft to a stent with a suture. The cylindrical graft is formed from a fabric having a thickness of 10-90 μm. The elastic modulus of the suture is 40 cN/dtex or less.