The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

Aug. 12, 2019
Applicant:

Surendra K. Chawla, Bloomfield, CT (US);

Inventor:

Surendra K. Chawla, Bloomfield, CT (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/02 (2006.01); A61B 1/32 (2006.01); A61B 1/06 (2006.01); A61B 17/00 (2006.01);
U.S. Cl.
CPC ...
A61B 17/0218 (2013.01); A61B 1/06 (2013.01); A61B 1/32 (2013.01); A61B 2017/00477 (2013.01); A61B 2017/0237 (2013.01); A61B 2217/005 (2013.01);
Abstract

A hands-free mitral papillary muscle exposure device provides a clear view of the papillary muscles, including the pathology of the leaflets and chordae tendineae of a mitral valve apparatus, and comprises a retractor device comprises two arm members pivotally connected to one another which can be manually spread and adjusted about a pivot point to a desired arrangement relative to the mitral valve apparatus to prevent injury to surrounding muscle and tissue during an operative procedure. Each arm member includes a respective downwardly extending longitudinal projection to hold one of the anterior and posterior leaflets adjacent to said arm member when the retractor device is positioned relative to the mitral valve apparatus. The longitudinal projection on the anterior side of the retractor device is longer than the corresponding longitudinal projection on the posterior side to accommodate the longer size of the anterior leaflet in comparison with the posterior leaflet.


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