The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
May. 07, 2018
University of Houston System, Houston, TX (US);
Vanderbilt University, Nashville, TN (US);
John C. Wolfe, Houston, TX (US);
Mufaddal Gheewala, Hillsboro, OR (US);
Wei-Chuan Shih, Houston, TX (US);
Gopathy Purushothaman, Pondicherry, IN;
UNIVERSITY OF HOUSTON SYSTEM, Houston, TX (US);
VANDERBILT UNIVERSITY, Nashville, TN (US);
Abstract
An optrode may provide a cylindrical substrate with two or more electrodes deposited on said cylindrical substrate. The cylindrical substrate and electrodes may be coated by an insulating layer with openings or vias over certain portions of the electrodes that may provide a contact for the neural probe or may be utilized to connect lead lines. Manufacturing of an optrode may utilize a jig that secures a cylindrical substrate coated by a conductive material and a resist. A first mask may be positioned in an opening provided by the jig, and the cylindrical substrate may expose ions or neutral particles to define one or more electrode patterns. After regions of the resist and conductive material are removed to form the electrodes, a second mask may be utilized to define via regions in which portions of the electrodes are exposed and uncoated by an insulating layer.