The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Oct. 24, 2018
Applicant:

Toyoda Gosei Co., Ltd., Kiyosu-shi, JP;

Inventor:

Kosuke Yahata, Chiba, JP;

Assignee:

TOYODA GOSEI CO., LTD., Kiyosu-Shi, Aichi-Ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/62 (2010.01); H01L 33/10 (2010.01); H01L 33/42 (2010.01); H01L 33/20 (2010.01); H01L 33/46 (2010.01); H01L 33/32 (2010.01); H01L 33/38 (2010.01);
U.S. Cl.
CPC ...
H01L 33/62 (2013.01); H01L 33/10 (2013.01); H01L 33/20 (2013.01); H01L 33/42 (2013.01); H01L 33/46 (2013.01); H01L 33/32 (2013.01); H01L 33/382 (2013.01); H01L 2933/0025 (2013.01); H01L 2933/0058 (2013.01);
Abstract

To provide a semiconductor light-emitting device with a multilayer film hardly peeled therefrom and a production method therefor. The light-emitting device has an uneven substrate having an uneven shape on a first surface, a first conduction type first semiconductor layer on the uneven shape of the uneven substrate, a light-emitting layer on the first semiconductor layer, a second conduction type second semiconductor layer on the light-emitting layer, and a third DBR covering at least a part of the first semiconductor layer, the light-emitting layer, and the second semiconductor layer. The light-emitting device is of a flip-chip type. In the periphery of the uneven substrate, the uneven shape has an exposed portion exposed without being covered by the first semiconductor layer. The third DBR covers at least a part of the exposed portion of the uneven shape.


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